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Proceedings Paper

Mix-and-match overlay performance of the NSR-S622D immersion scanner
Author(s): Katsushi Makino; Takahisa Kikuchi; Satoru Sasamoto; Park Hongki; Akiko Mori; Nobuyuki Takahashi; Shinji Wakamoto
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Paper Abstract

Current technology nodes, as well as subsequent generations necessitate ongoing improvements to the mix-and-match overlay (MMO) capabilities of lithography scanners. This work will introduce newly developed scanner solutions to address this requirement, and performance data from the latest generation immersion scanner, the NSR-S622D, will be introduced. Enhanced MMO accuracy is imperative for the 22 nm half-pitch and future technology nodes. In order for the matched overlay accuracy to approach single machine overlay (SMO) capabilities, MMO errors must be reduced further. The dominant MMO error sources can be divided into three main areas: SMO, lens distortion matching and wafer grid matching. Nikon continues to decrease these matching error contributors over time, and the latest generation NSRS622D immersion scanner provides a number of innovative solutions to satisfy the most demanding overlay matching requirements ; as a result MMO performance within 3nm is achieved on S622D. Moreover, overlay master system is developed for further product overlay accuracy and stability improvement.

Paper Details

Date Published: 12 April 2013
PDF: 12 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86830Q (12 April 2013); doi: 10.1117/12.2010875
Show Author Affiliations
Katsushi Makino, Nikon Corp. (Japan)
Takahisa Kikuchi, Nikon Corp. (Japan)
Satoru Sasamoto, Nikon Corp. (Japan)
Park Hongki, Nikon Corp. (Japan)
Akiko Mori, Nikon Corp. (Japan)
Nobuyuki Takahashi, Nikon Corp. (Japan)
Shinji Wakamoto, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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