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Proceedings Paper

Superselective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithography
Author(s): Zuwei Liu; Xiaodan Gu; Deirdre Olynick
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Proc. SPIE 8685, Advanced Etch Technology for Nanopatterning II, 86850O; doi: 10.1117/12.2010834
Show Author Affiliations
Zuwei Liu, Lawrence Berkeley National Lab. (United States)
Xiaodan Gu, Univ. of Massachusetts Amherst (United States)
Deirdre Olynick, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 8685:
Advanced Etch Technology for Nanopatterning II
Ying Zhang; Gottlieb S. Oehrlein; Qinghuang Lin, Editor(s)

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