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Proceedings Paper

Development status of EUV resist to break the triangle
Author(s): Takanori Kawakami; Kenji Hoshiko; Ken Maruyama; Makoto Shimizu; Tooru Kimura
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Paper Details

Date Published:
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790Z; doi: 10.1117/12.2010665
Show Author Affiliations
Takanori Kawakami, JSR Corporation (Japan)
Kenji Hoshiko, JSR Micro n.v. (Belgium)
Ken Maruyama, JSR Micro INC (United States)
Makoto Shimizu, JSR Corporation (Japan)
Tooru Kimura, JSR Corporation (Japan)

Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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