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Proceedings Paper

Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ
Author(s): Kenji Honda; Bernard T. Beauchemin; Rodney J. Hurditch; Andrew J. Blakeney; Yasumasa Kawabe; Tadayoshi Kokubo
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Paper Abstract

effects in the development process. A comprehensive theory ofdissolution inhibition in novolak-DNQ (diazonaphthoquinone) resist is proposed, which is based on experimental studies of novolak-PAC (photoactive compound) interactions and the relationship between novolak microstructres and dissolution inhibition. The theory invokes a "two-step mechanism". Static molecular interactions between novolak and DNQ are augmented by secondary dynamic

Paper Details

Date Published: 1 June 1990
PDF: 8 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20104
Show Author Affiliations
Kenji Honda, Olin Hunt Specialty Products I (South Korea)
Bernard T. Beauchemin, Olin Hunt Specialty Products I (United States)
Rodney J. Hurditch, Olin Hunt Specialty Products I (United States)
Andrew J. Blakeney, Olin Hunt Specialty Products I (United States)
Yasumasa Kawabe, Fuji Photo Film Co., Ltd. (Japan)
Tadayoshi Kokubo, Fuji Photo Film Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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