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Proceedings Paper

Effect of deposition conditions on the stoichiometry and structural properties of LiNbO3 thin films deposited by MOCVD
Author(s): Samuel Margueron; Ausrine Bartasyte; Valentina Plausinaitiene; Adulfas Abrutis; Pascal Boulet; Virgaudas Kubilius; Zita Saltyte
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Paper Abstract

Epitaxial LiNbO3 thin films were deposited on C-sapphire substrates by pulsed injection metal organic chemical vapor deposition and atmospheric pressure metal organic chemical vapor deposition. The effect of deposition conditions, such as the ratio of Li/Nb precursors in solution and the deposition pressure, on the phase composition, Li nonstoichiometry, texture, epitaxial quality, residual stresses and formation of twins in LiNbO3 films was studied by means of X-ray diffraction and Raman spectroscopy. It was found that the deposition pressure played an important role in the incorporation of Li2O in the film and the formation of in-plane and out-of-plane twins.

Paper Details

Date Published: 18 March 2013
PDF: 8 pages
Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862612 (18 March 2013); doi: 10.1117/12.2010105
Show Author Affiliations
Samuel Margueron, LMOPS-EA (France)
Ausrine Bartasyte, Institute Jean Lamour, CNRS, Univ. de Lorraine (France)
Valentina Plausinaitiene, Vilnius Univ. (Lithuania)
Adulfas Abrutis, Vilnius Univ. (Lithuania)
Pascal Boulet, Institute Jean Lamour, CNRS, Univ. de Lorraine (France)
Virgaudas Kubilius, Vilnius Univ. (Lithuania)
Zita Saltyte, Vilnius Univ. (Lithuania)

Published in SPIE Proceedings Vol. 8626:
Oxide-based Materials and Devices IV
Ferechteh Hosseini Teherani; David C. Look; David J. Rogers, Editor(s)

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