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Proceedings Paper

Characteristics of new KrF excimer laser resist
Author(s): Takeshi Kotani; Mitsuhiko Sano; Kei-ichi Hayashi; Hideo Kikuchi
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Paper Abstract

New alkali-soluble polymer which is highly transparent at 248nm were prepared. Alkali-dissolution rate, optical transmission at 248nm and RIE resistance of the polymer were studied. As a sensitizer, diazoketone compounds were newly synthesized and provided an intense bleachable absorbance at 248nm. The new KrF excimer laser positive resist (NEX) composed of the diazoketone as the sensitizer and the maleimide copolymer as the base polymer has been developed.

Paper Details

Date Published: 1 June 1990
PDF: 8 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20101
Show Author Affiliations
Takeshi Kotani, Nagase Electronic Chemicals Ltd. (Japan)
Mitsuhiko Sano, Nagase Electronic Chemicals Ltd. (Japan)
Kei-ichi Hayashi, Toyo Gosei Kogyo Co., Ltd. (Japan)
Hideo Kikuchi, Toyo Gosei Kogyo Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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