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Proceedings Paper

Effect of 2,1,4 DAQ ester chemistry on the behavior of I-line image reversal resists
Author(s): John J. Grunwald; Chava Gal; Sigalit Eidelman
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Paper Abstract

This paper studies the etiemistry of image reversal (1R) systems based on 2,1,4- diazoquinone substituted trihydroxybenzophenone (THBP) , tetrahydroxybenzophenone (tetra-HBP), p-cumylphenol (PCP) and novolac resins (N). Results are investigated in depth as to their impact on the functional behavior of the IR resist. Both cross-linking and decarboxylation modes are studied , as they relate to energy to clear. It is shown that using cross-linking systems based on the above DAQ esters, a m/p novolac, and a bifunctional cross-linking agent of the type '2 wherein X = OH, the broadband energy required to effect cross-linking decreases in the order of PCP > N > tetra-HBP > THBP. The concentration of the afore- mentioned sensitizers was in all cases equimolar in terms of diazo content. Surprisingly, in decarboxylation IR, the exposure energy required to effect decarboxylation decreases in the order of tetra-HBP > THBP > N > PCP, essentially a complete reversal as compared with cross-linking type IR.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20099
Show Author Affiliations
John J. Grunwald, MacDermid Inc. (United States)
Chava Gal, MacDermid Inc. (Israel)
Sigalit Eidelman, MacDermid Inc. (Israel)


Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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