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Proceedings Paper

A simplified model for HF chemical laser amplifier
Author(s): Wenguang Liu; Xing Chen; Hongyan Wang; WeiHong Hua
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Paper Abstract

]HF chemical laser with MOPA configuration is a good solution to achieve high output power with high reliability. Kinetic models for HF amplifier are important for prediction and optimization of the performance of MOPA chemical lasers. In this paper, a simplified model for HF chemical laser amplifier is presented. The main processes which are included in the model are: (a) chemical pumping of HF (v=2) and HF (v=1), (b) stimulated transitions and spontaneous emission. (c) relaxation of vibration excited HF molecule by H2,N2 and HF. Some assumptions are taken in this model: (a) the density of H2, N2, HF, translational temperature and velocity of gas mixture are averaged across the laser cross section, (b) only two vibration-rotational transitions (2P6, 1P7) occurs in the amplifier, (c) gas temperature does not change during the lasing process in the amplifier. Based on these assumptions, a set of three-level rate equations is formulated and then solved by an iterative technique. Comparison is made with recent experimentally obtained data from a low power discharge-driven CW HF laser with MOPA configuration. It is shown that experimental results are consistent with the calculation from the simplified model.

Paper Details

Date Published: 30 January 2013
PDF: 5 pages
Proc. SPIE 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012, 867713 (30 January 2013); doi: 10.1117/12.2009491
Show Author Affiliations
Wenguang Liu, National Univ. of Defense Technology (China)
Xing Chen, National Univ. of Defense Technology (China)
Hongyan Wang, National Univ. of Defense Technology (China)
WeiHong Hua, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 8677:
XIX International Symposium on High-Power Laser Systems and Applications 2012
Kerim R. Allakhverdiev, Editor(s)

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