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Proceedings Paper

Research on theoretical analysis of active fluid jet polishing
Author(s): Tianxiang Sun; Long Sun; Feng Wang; Shunfu Liu
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Paper Abstract

This paper presents the principle of active fluid jet polishing for rapid fabrication. By means of the establishing corresponding mathematical model, a proposed method for producing mid or large sized high precision mirror is discussed in detail. After the final process of active fluid jet polishing, the surface figure PV is about 0.09λ(λ=633nm), the RMS is about 1/60λ and surface roughness RMS of single crystal silicon achieves 1nm. The result of experiment testify active fluid jet polishing could get the mirror of high precision and super smooth surface.

Paper Details

Date Published: 16 October 2012
PDF: 5 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84162P (16 October 2012); doi: 10.1117/12.2009389
Show Author Affiliations
Tianxiang Sun, Dalian Institute of Chemical and Physics (China)
Long Sun, Dalian Institute of Chemical and Physics (China)
Feng Wang, Dalian Institute of Chemical and Physics (China)
Shunfu Liu, Dalian Institute of Chemical and Physics (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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