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Proceedings Paper

Evolution and control of optical thin film stress
Author(s): Ming Fang; JingPing Li; HongBo He; Zhengxiu Fan; Qilin Xiao; ZhaoYang Li
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Paper Abstract

Fine control of Optical Thin Film Stress is critical to develop an expected profile parameters of large aperture coated optics. In our latest effort, the evolution of stress and force per unit width of multilayer thin film formulas, (H2L)6, (H2L)5H and (HL)7, consisted of HfO2 and SiO2 were researched. The stresses of SiO2 single layers deposited on the HfO2 were small than those grew on glass and get smaller as the multilayer thin film deposited. While the stresses of HfO2 films deposited on the SiO2 were positive correlation with the stress of SiO2.

Paper Details

Date Published: 16 October 2012
PDF: 7 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160K (16 October 2012); doi: 10.1117/12.2009292
Show Author Affiliations
Ming Fang, Shanghai Institute of Optics and Fine Mechanics (China)
JingPing Li, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
HongBo He, Shanghai Institute of Optics and Fine Mechanics (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics (China)
Qilin Xiao, Shanghai Institute of Optics and Fine Mechanics (China)
ZhaoYang Li, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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