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Proceedings Paper

Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist
Author(s): Siddhartha Das; James W. Thackeray; Masayuki Endo; Joseph C. Langston; Henry T. Gaw
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Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20088
Show Author Affiliations
Siddhartha Das, Intel Corp. (United States)
James W. Thackeray, Shipley Co., Inc. (United States)
Masayuki Endo, Matsushita Electric Industrial Co., Ltd. (Japan)
Joseph C. Langston, Intel Corp. (United States)
Henry T. Gaw, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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