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Proceedings Paper

Negative tone aqueous developable resist for photon, electron, and x-ray lithography
Author(s): Will Conley; Wayne M. Moreau; Stanley Perreault; Gary T. Spinillo; Robert L. Wood; Jeffrey D. Gelorme; Ronald M. Martino
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Paper Abstract

The use of negative acting photoresists has become a integral part of device fabrication strategy. In this paper we will. discuss a phenolic based photoresist which incorporates a crosslinkable resin and an acid generating sensitizer. When exposed and thermally treated, the resist forms a negative tone image which is developable in an alkaline medium. We will discuss the materials, processes and results from photon, electron and X-ray lithographic evaluations.

Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20087
Show Author Affiliations
Will Conley, IBM Corp. (United States)
Wayne M. Moreau, IBM Corp. (United States)
Stanley Perreault, IBM Corp. (United States)
Gary T. Spinillo, IBM Corp. (United States)
Robert L. Wood, IBM Corp. (United States)
Jeffrey D. Gelorme, IBM Corp. (United States)
Ronald M. Martino, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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