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Proceedings Paper

Fully automatic measuring system for submicron lithography
Author(s): Hisao Izawa; Kenjiro Nakai; Masami Seki
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Paper Abstract

The Laser Interferometric X-Y Measuring System Model XY-21 has been used around the world for many years as the standard machine of measuring coordinate of reticles and masks for IC and LSI. However, indications are that the capability of the XY-2I may not be sufficient to match the ever increasing trend toward ultra large scale integration (ULSI). In response, we have recently developed a successor to the XY-2I,the Laser Interferometric X-Y Measuring System Model XY-3I. The new system is designed to meet the requirements of the ULSI era. The XY-3I enables very accurate, full automatic measurement of pattern coordinate on masks and reticles, as well as the critical dimension (CD). The system can handle the patterns on the wafers equally well, with the capabilities of highly accurate measurement of coordinate position, CD and overlay registration of pattern. An additional feature of the XY-3I is bow compensation, which decreases fluctuation among measurement data due to bow change of sample. This paper presents the improvements, new functions, performance and applications of the XY-.3I.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20073
Show Author Affiliations
Hisao Izawa, Nikon Corp. (Japan)
Kenjiro Nakai, Nikon Corp. (Japan)
Masami Seki, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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