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Proceedings Paper

Determination of effective width of resist lines by correlation of develop inspect and final inspect CD measurement data
Author(s): J. Kevin McConathy; Ralph Stepp
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Paper Details

Date Published: 1 June 1990
PDF: 5 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20068
Show Author Affiliations
J. Kevin McConathy, Nanometrics, Inc. (United States)
Ralph Stepp, Sematech Inc. (United States)


Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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