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Proceedings Paper

Focused electron-beam induced deposition of plasmonic nanostructures from aqueous solutions
Author(s): M. Bresin; N. Nehru; J. Todd Hastings
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Paper Abstract

Electron-beam-induced deposition (EBID) is a gas-phase direct-write technique capable of sub-10 nm resolution, with applications in micro- and nanoscale object manipulation, mask repair, and circuit edit. While several high purity materials can be deposited by EBID, the majority of deposits suffer from undesirable co-deposition of organic or inorganic ligands. As a result, impurity incorporation limits EBID application in processes requiring high purity. Recently, a complimentary technique known as liquid phase EBID (LP-EBID) has been shown to drastically improve deposit purity by utilizing precursors without carbon or phosphorous based architectures. Here we demonstrate direct-write deposition of silver nanostructure arrays, with tunable geometry for localized surface plasmon resonance (LSPR) control. Nanoparticle arrays with 55 – 100 nm diameters were obtained. Resonant wavelengths between 550 - 600 nm were achieved and correlated to the observed nanoparticle geometry. These results demonstrate how LP-EBID can be used to provide site-specific deposition for plasmonic devices and additionally open the door to fields inaccessible to traditional gas-phase EBID.

Paper Details

Date Published: 5 March 2013
PDF: 6 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861306 (5 March 2013); doi: 10.1117/12.2005242
Show Author Affiliations
M. Bresin, Univ. of Kentucky (United States)
N. Nehru, Univ. of Kentucky (United States)
J. Todd Hastings, Univ. of Kentucky (United States)

Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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