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Proceedings Paper

Measuring refractive indices of films on semiconductors by microreflectometry
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Paper Abstract

Refractive index variations of film materials are measured using a spectral micro-reflectometer, the Tencor® TF-1. The principles of thickness and refractive index determination are discussed. An effective medium model of film materials is applied to calculating refractive indices and their wavelength dependence. Refractive indices for typical poly-crystalline silicon are given. Compositional and structural inhomogeneities cause refractive index variations. Neglecting these index variations leads to misinterpretation of film thickness measurements.

Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20052
Show Author Affiliations
Stanley E. Stokowski, Tencor Instruments (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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