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Proceedings Paper

Optimizing anatase-TiO2 deposition for low-loss planar waveguides
Author(s): Lili Jiang; Christopher C. Evans; Orad Reshef; Eric Mazur
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Paper Abstract

Polycrystalline anatase-TiO2 thin film possesses desirable properties for on-chip photonic devices that can be used for optic computing, communication, and sensing. Low-loss anatase-TiO2 thin films are necessary for fabricating high quality optical devices. We studied anatase-TiO2 by reactively sputtering titanium metal in an oxygen environment and annealing. By correlating key deposition parameters, including oxygen flow rate, deposition pressure, RF power, and temperature to film morphology and planar waveguiding losses, we aim to understand the dominant source of propagation losses in TiO2 thin films and achieve higher quality, lower-loss films.

Paper Details

Date Published: 18 March 2013
PDF: 8 pages
Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261D (18 March 2013); doi: 10.1117/12.2005169
Show Author Affiliations
Lili Jiang, Harvard College (United States)
Christopher C. Evans, Harvard School of Engineering and Applied Sciences (United States)
Orad Reshef, Harvard School of Engineering and Applied Sciences (United States)
Eric Mazur, Harvard School of Engineering and Applied Sciences (United States)


Published in SPIE Proceedings Vol. 8626:
Oxide-based Materials and Devices IV
Ferechteh Hosseini Teherani; David C. Look; David J. Rogers, Editor(s)

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