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Proceedings Paper

28 Gb/s 850 nm oxide VCSEL development at Avago
Author(s): Jingyi Wang; Mark Keever; Zheng-Wen Feng; Thomas Fanning; Chen Chu; Aadi Sridhara; Friedhelm Hopfer; Terry Sale; An-Nien Cheng; Bing Shao; Li Ding; Pengyue Wen; Hsu-Hao Chang; Charlie Wang; David Chak Wang Hui; Laura Giovane
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Paper Abstract

Avago’s 850nm oxide VCSEL for applications requiring modulation at 25-28G has been designed for -3dB bandwidths in excess of 18GHz over an extended temperature range of 0-85C. The VCSEL has been optimized to minimize DBR mirror thermal resistivity, electrical resistance and optical losses from free carrier absorption. The active region is designed for superior differential gain to enable high optical bandwidths. The small-signal modulation response has been characterized and the large-signal eye diagrams show excellent high-speed performance. Characterization data on other link parameters such as relative intensity noise and spectral width will also be presented.

Paper Details

Date Published: 13 March 2013
PDF: 6 pages
Proc. SPIE 8639, Vertical-Cavity Surface-Emitting Lasers XVII, 86390K (13 March 2013); doi: 10.1117/12.2004521
Show Author Affiliations
Jingyi Wang, Avago Technologies Ltd. (United States)
Mark Keever, Avago Technologies Ltd. (United States)
Zheng-Wen Feng, Avago Technologies Singapore (Singapore)
Thomas Fanning, Avago Technologies Singapore (Singapore)
Chen Chu, Avago Technologies Singapore (Singapore)
Aadi Sridhara, Avago Technologies Singapore (Singapore)
Friedhelm Hopfer, Avago Technologies Singapore (Singapore)
Terry Sale, Avago Technologies Singapore (Singapore)
An-Nien Cheng, Avago Technologies Ltd. (United States)
Bing Shao, Avago Technologies Ltd. (United States)
Li Ding, Avago Technologies Ltd. (United States)
Pengyue Wen, Avago Technologies Ltd. (United States)
Hsu-Hao Chang, Avago Technologies Ltd. (United States)
Charlie Wang, Avago Technologies Ltd. (United States)
David Chak Wang Hui, Avago Technologies Ltd. (United States)
Laura Giovane, Avago Technologies Ltd. (United States)


Published in SPIE Proceedings Vol. 8639:
Vertical-Cavity Surface-Emitting Lasers XVII
Kent D. Choquette; James K. Guenter, Editor(s)

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