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Proceedings Paper

III-V access waveguides using atomic layer deposition
Author(s): Khaled Mnaymneh; Simon Frédérick; Dan Dalacu; Jean Lapointe; Philip J. Poole; Robin L. Williams
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Paper Abstract

Normally, the larger refractive index contrast of silicon-on-insulator (SOI) photonics used for transporting highly confined optical modes is not available in compound semiconductor systems because the optically active layer rests upon an epitaxial support layer having a similar refractive index. Here, a semiconductor-under-insulator (SUI) technology for compound semiconductor membrane photonic circuitry is presented. It will be shown that such a technology can facilitate the transport of highly confined optical modes in compound semiconductor systems and is anticipated to be a critical part of future scalable quantum photonics applications.

Paper Details

Date Published: 5 March 2013
PDF: 5 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 86130D (5 March 2013); doi: 10.1117/12.2004310
Show Author Affiliations
Khaled Mnaymneh, Univ. of Michigan (United States)
Simon Frédérick, National Research Council Canada (Canada)
Dan Dalacu, National Research Council Canada (Canada)
Jean Lapointe, National Research Council Canada (Canada)
Philip J. Poole, National Research Council Canada (Canada)
Robin L. Williams, National Research Council Canada (Canada)


Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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