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Proceedings Paper

High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography
Author(s): Peng Zhu; L. Jay Guo
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Paper Abstract

We demonstrate a nanostructured broadband absorber in visible range. Two kinds of structures with different absorption ranges are designed and fabricated using nanoimprint lithography. Experiments show a flat absorption spectra with an average absorption of 85% from 400 nm to 700 nm. The proposed structures could be used in the applications of thin-film thermal emitters and photovoltaic devices.

Paper Details

Date Published: 21 February 2013
PDF: 7 pages
Proc. SPIE 8632, Photonic and Phononic Properties of Engineered Nanostructures III, 86321A (21 February 2013); doi: 10.1117/12.2004131
Show Author Affiliations
Peng Zhu, Univ. of Michigan (United States)
Harbin Institute of Technology (China)
L. Jay Guo, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 8632:
Photonic and Phononic Properties of Engineered Nanostructures III
Ali Adibi; Shawn-Yu Lin; Axel Scherer, Editor(s)

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