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Proceedings Paper

Practical photomask linewidth measurements
Author(s): James E. Potzick
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Paper Abstract

The measurement cycle for practical accurate photomask linewidth measurements is analyzed as a differential measurement- -the linewidth to be measured is compared to a known linewidth on a standard photomask. The linewidth measuring instrument is thus a comparator. The conditions necessary for a valid measurement are discussed with regard to both the instrument and the comparison process. The principles discussed here apply to many other types of measurement as well.

Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20039
Show Author Affiliations
James E. Potzick, National Institute for Standards and Technology (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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