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Proceedings Paper

Large-bandwidth deep-UV microscopy for CD metrology
Author(s): Olivier Hignette; Janusz Woch; Laurence Gotti
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Paper Abstract

To adress the problems encountered when measuring subinicrons CD patterns with white light microscopy, an instrument using the ultraviolet spectrum around 280 urn has been designed and tested. The technologies developped for dealing simultaneously with ultraviolet, visible and infrared light are pnsented. The main advantage lies in the absorbance ofphotonsists, leading to simple optical proffles. Theontical results obtained with a modelling approach are iepoited along with experimental results characterized with respect to SEM cross sections.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20036
Show Author Affiliations
Olivier Hignette, Micro-Controle (France)
Janusz Woch, Micro-Controle (France)
Laurence Gotti, Micro-Controle (France)


Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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