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Proceedings Paper

Object contrast in the confocal microscope and applications to lithographic metrology
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Paper Abstract

We show that the focal planecontrast of the confocal scanning thser microscope can be used effectively to measure critical dimensions at the base ofsubmicrometer photoresist structures. The results, when compared with high-voltage SEM measurements, are found to be highly feature dependent; separate threshold optimizations are required for each case. A new criterion, incremental response, was introduced to aid in measurement system evaluation.

Paper Details

Date Published: 1 June 1990
PDF: 7 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20034
Show Author Affiliations
Kevin M. Monahan, Signetics Co. (United States)
Jozef P. H. Benschop, Signetics Co. (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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