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Proceedings Paper

Certain linewidth measurements
Author(s): Karl L. Harris; Israel Nadler Niv; Dorron D. Levy
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Paper Abstract

As feature sizes get smaller the error of measurement must also become smaller. An adequate sub-micron measurement must be correct, within a certain or determined error limit. The error limit for a metrology instrument designed for use on sub-micron features in a production environment, the Opal 702, was investigated experimentally. There are numerous contributors to Iinewidth measurement uncertainty; (1) Dynamic Precision (including wafer and system variations), (2) system Stability (determined in a way to avoid including wafer stability), and (3) Offset (dependent on signal interpretation or algorithm) [1]. In a practical way all these variables are incorporated in (4) Dynamic Uncertainty.

Paper Details

Date Published: 1 June 1990
PDF: 5 pages
Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); doi: 10.1117/12.20028
Show Author Affiliations
Karl L. Harris, Opal, Inc. (United States)
Israel Nadler Niv, Opal, Inc. (United States)
Dorron D. Levy, Opal, Inc. (United States)

Published in SPIE Proceedings Vol. 1261:
Integrated Circuit Metrology, Inspection, and Process Control IV
William H. Arnold, Editor(s)

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