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Proceedings Paper

Thermally induced structural and phase transformations of Mo-Si and MoSi2-Si x-ray multilayer mirrors
Author(s): Anatoli I. Fedorenko; A. S. Garbuz; V. V. Kondratenko; Yurii P. Pershin; V. E. Pukha; O. V. Poltseva; S. A. Yulin; E. N. Zubarev
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Paper Abstract

The effect of elevated temperatures on the structural stability of Mo - Si and MoSi2 - Si X-ray multilayer mirrors was studied. Multilayers deposited by magnetron sputtering were annealed at temperatures ranging from 300 to 1300 K. A detailed picture of the thermally induced changes in the microstructure is obtained using several techniques including small- and large-angle X-ray scattering and transmission electron microscopy. The main causes of the degradation of Mo - Si mirrors is an interdiffusion mixing of silicon and molybdenum layers and a formation of MoSi2 in both the hexagonal and tetragonal phases. The smoothening of interfaces in MoSi2 - Si mirrors and increasing of their reflectance were observed after annealing at temperatures T < 800 K. The MoSi2 - Si mirrors undergo a catastrophic degradation at T > 1000 K caused by a crystallization of amorphous Si and a recrystallization of hexagonal MoSi2.

Paper Details

Date Published: 23 January 1995
PDF: 10 pages
Proc. SPIE 2453, X-Ray Optics and Surface Science, (23 January 1995); doi: 10.1117/12.200276
Show Author Affiliations
Anatoli I. Fedorenko, Kharkov Polytechnical Institute (Ukraine)
A. S. Garbuz, Kharkov Polytechnical Institute (Ukraine)
V. V. Kondratenko, Kharkov Polytechnical Institute (Ukraine)
Yurii P. Pershin, Kharkov Polytechnical Institute (Ukraine)
V. E. Pukha, Kharkov Polytechnical Institute (Ukraine)
O. V. Poltseva, Kharkov Polytechnical Institute (Ukraine)
S. A. Yulin, Kharkov Polytechnical Institute (Ukraine)
E. N. Zubarev, Kharkov Polytechnical Institute (Ukraine)


Published in SPIE Proceedings Vol. 2453:
X-Ray Optics and Surface Science
Alexander V. Vinogradov, Editor(s)

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