Share Email Print
cover

Proceedings Paper

Time and space resolved investigations of confined fs ablation of Ta2O5/Pt thin film systems
Author(s): S. Rapp; J. Rosenberger; M. Domke; G. Heise; M. Schmidt; H. P. Huber
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Maskless patterning of biocompatible sensor chips consisting of a Ta2O5/Pt/glass layer system can be realized by ultrashort laser pulse ablation allowing fast and precise structuring. Here, a 650 fs laser at a center wavelength of 1053 nm is used at a peak fluence of 5 J/cm2. It was observed, that a greater diameter of the Pt film (400 nm) is ablated when it’s coated with Ta2O5 (200 nm) compared to the uncoated Pt. One reason was found in the anti-reflective effect of the Ta2O5 layer causing an increase of energy deposition in the material. The underlying physical effects of the ablation reaction are investigated over the whole reaction time ranging temporally from fs to μs by ultrafast pump-probe microscopy. For the direct ablation of the uncoated Pt, results show ultrafast heating and melting after 2 ps, the creation of a gas-liquid mixture and plasma at 10 ps. At around 100 ns the actual ablation takes place indicated by the ejection of small particles. The results for the Ta2O5/Pt layer system reveal heating and electron excitation in the Ta2O5 layer during the first 2 ps. In the following the spot center behaves identical to the direct ablation of Pt. Here, the Ta2O5 is ablated with the Pt. A confined ablation where an additional amount of laser energy is deposited in the layer system or at the layer interface is assumed to take place. In the rim of the spot only the Ta2O5 is removed by indirectly-induced ablation at around 35 ns.

Paper Details

Date Published: 29 March 2013
PDF: 8 pages
Proc. SPIE 8607, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVIII, 86070C (29 March 2013); doi: 10.1117/12.2002409
Show Author Affiliations
S. Rapp, Hochschule für Angewandte Wissenschaften München (Germany)
J. Rosenberger, Hochschule für Angewandte Wissenschaften München (Germany)
M. Domke, Hochschule für Angewandte Wissenschaften München (Germany)
G. Heise, Hochschule für Angewandte Wissenschaften München (Germany)
M. Schmidt, Friedrich-Alexander Univ. Erlangen-Nürnberg (Germany)
H. P. Huber, Hochschule für Angewandte Wissenschaften München (Germany)


Published in SPIE Proceedings Vol. 8607:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVIII
Xianfan Xu; Guido Hennig; Yoshiki Nakata; Stephan W. Roth, Editor(s)

© SPIE. Terms of Use
Back to Top