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Proceedings Paper

Optical characterization parameters by study and comparison of subwavelength patterns for color filtering and multispectral purpose
Author(s): J. Matanga; Y. Lacroute; P. Gouton; E. Bourillot
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Paper Abstract

In the present work, we have analyzed the optical parameters of the thin layers Ge, Ag, and Au prepared by lithography and used as front contact and absorber in the C-MOS device structure. The experimental data concern the reflectance R and transmittance T in the visible and near infrared region. The interpretation of these results are based on the method of analysis of R and T developed by Tomlin and on the Mueller numerical method of resolution of nonlinear equation give by Abelès[1] method. Thus we have chosen by comparing all method to use Lorenz-Mie theory diffusion [2]. The simulation results allow us to choose gold to realize our pattern.

Paper Details

Date Published: 19 February 2013
PDF: 9 pages
Proc. SPIE 8659, Sensors, Cameras, and Systems for Industrial and Scientific Applications XIV, 86590R (19 February 2013); doi: 10.1117/12.2002332
Show Author Affiliations
J. Matanga, Lab. Electronique, Informatique et Image, CNRS, Univ. de Bourgogne (France)
Y. Lacroute, Lab. Interdisciplinaire Carnot de Bourgogne, CNRS, Univ. de Bourgogne (France)
P. Gouton, Lab. Electronique, Informatique et Image, CNRS, Univ. de Bourgogne (France)
E. Bourillot, Lab. Interdisciplinaire Carnot de Bourgogne, CNRS, Univ. de Bourgogne (France)


Published in SPIE Proceedings Vol. 8659:
Sensors, Cameras, and Systems for Industrial and Scientific Applications XIV
Ralf Widenhorn; Antoine Dupret, Editor(s)

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