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Proceedings Paper

Chiral plasmonic nanostructures: experimental and numerical tools
Author(s): Gediminas Gervinskas; Lorenzo Rosa; Etienne Brasselet; Saulius Juodkazis
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Paper Abstract

A combination of electron- and ion-beam lithographies has been applied to fabricate patterns of plasmonic nanoparticles having tailored optical functions: they create hot-spots at predefined locations on the nanoparticle at specific wavelengths and polarizations of the incident light field. Direct inscribing of complex chiral patterns into uniform nano-disks of sub-wavelength dimensions, over extensive 20-by-20 μm2 areas, is achieved with high fidelity and efficiency; typical groove widths are in 10-30 nm range. Such patterns can perform optical manipulation functions like nano-tweezing and chiral sorting. Fabrication procedures can be optimized to pattern thin 0.1-2.5 μm-thick membranes with chiral nanoparticles having sub-15 nm grooves. Peculiarities of optical force and torque calculations using finite-difference time-domain method are presented.

Paper Details

Date Published: 5 March 2013
PDF: 13 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861304 (5 March 2013); doi: 10.1117/12.2002281
Show Author Affiliations
Gediminas Gervinskas, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Lorenzo Rosa, Swinburne Univ. of Technology (Australia)
Etienne Brasselet, Lab. Ondes et Matière d'Aquitaine, CNRS, Univ. Bordeaux 1 (France)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)


Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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