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Proceedings Paper

Low-NA focused vortex beam lithography for below 100-nm feature size at 405 nm illumination
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Paper Abstract

We present a novel method for the optical fabrication of particular structures with sub-100-nm features by using direct-write laser lithography at 405-nm wavelength. A doughnut-shaped spot, generated by focusing an azimuthally polarized beam using an NA=0.2 lens, exhibits a central dark region, i.e., optical vortex. This is the key to write well-isolated nano-structures like nano-cylinders. A decomposition of such doughnut spots leads to two-half-lobes spots that can create line patterns when linearly scanned. This method is fast and inexpensive to fabricate well-isolated nano-cylinders or nano-holes and nanometer-size line patterns or trenches compared to other nano-fabrication methods. They can find applications for the fabrication of a nano solid immersion lens, an isolated quantum dot, plasmonic waveguides, and for micro- and nano-fluidics.

Paper Details

Date Published: 5 March 2013
PDF: 6 pages
Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 86131A (5 March 2013); doi: 10.1117/12.2002138
Show Author Affiliations
Myun-Sik Kim, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
SUSS MicroOptics SA (Switzerland)
Toralf Scharf, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Hans Peter Herzig, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)


Published in SPIE Proceedings Vol. 8613:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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