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Proceedings Paper

Lensless imaging system to quantify cell proliferation
Author(s): S. Vinjimore Kesavan; C. P. Allier; F. Navarro; F. Mittler; B. Chalmond; J.-M. Dinten
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Paper Abstract

Owing to its simplicity, lensless imaging system is adept at continuous monitoring of adherent cells inside the incubator. The setup consists of a CMOS sensor with pixel pitch of 2.2 μm and field of view of 24 mm2, LED with a dominating wavelength of 525 nm, along with a pinhole of 150 μm as the source of illumination. The in-line hologram obtained from cells depends on the degree of cell-substrate adhesion. Drastic difference is observed between the holographic patterns of floating and adherent cells. In addition, the well-established fact of reduction of cell-substrate contact during cell division is observed with our system based on corresponding spontaneous transition in the holographic pattern. Here, we demonstrate that by recognizing this specific holographic pattern, number of cells undergoing mitosis in a cell culture with a population of approximately 5000 cells, can be estimated in real-time. The method is assessed on comparison with Edu-based proliferation assay. The approach is straightforward and it eliminates the use of markers to estimate the proliferation rate of a given cell culture. Unlike most proliferation assays, the cells are not harvested enabling continuous monitoring of cell culture.

Paper Details

Date Published: 22 February 2013
PDF: 11 pages
Proc. SPIE 8587, Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI, 858708 (22 February 2013); doi: 10.1117/12.2001826
Show Author Affiliations
S. Vinjimore Kesavan, CEA-LETI, Minatec (France)
C. P. Allier, CEA-LETI, Minatec (France)
F. Navarro, CEA-LETI, Minatec (France)
F. Mittler, CEA-LETI, Minatec (France)
B. Chalmond, Univ. de Cergy-Pontoise (France)
ENS-Cachan (France)
J.-M. Dinten, CEA-LETI, Minatec (France)

Published in SPIE Proceedings Vol. 8587:
Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues XI
Daniel L. Farkas; Dan V. Nicolau; Robert C. Leif, Editor(s)

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