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Proceedings Paper

Nonlinear absorption in InN under resonant- and non-resonant excitation
Author(s): H. Ahn; M.-T. Lee; Y.-M. Chang; J. L. Peng; S. Gwo
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Paper Abstract

We report the wavelength-dependent nonlinear absorption (NLA) of InN film grown on anr-plane sapphire by molecular beam epitaxy technique. In order to understand the nonlinear optical properties of InN, the Z-scan measurement was performed at two different wavelengths, the photon energies of which are near (resonant excitation) and much higher (non-resonant excitation) than the bandgap of InN, respectively. Under non-resonant excitation, band-filling effect leads the dominant saturable absorption, while under resonant excitation, reverse saturable absorption dominates the nonlinear absorption. From the open-aperture Z-scan measurement under resonant excitation, we found that InN exhibits more than one nonlinear absorption process simultaneously. Particularly, under relatively weak resonant excitation, the transformation from saturable absorption to 2PA through the intermediate excitation state absorption was observed as the sample approaches the beam focus. The close-aperture Z-scan signals of InN show valley-peak response, implying that the nonlinear refraction in InN is caused by the self-focusing of the Gaussian laser beam. Using the Z-scan theory, the corresponding nonlinear parameters, such as saturation intensity, 2PA coefficient, and nonlinear refractive index, of InN were estimated.

Paper Details

Date Published: 4 March 2013
PDF: 6 pages
Proc. SPIE 8625, Gallium Nitride Materials and Devices VIII, 86250L (4 March 2013); doi: 10.1117/12.2001769
Show Author Affiliations
H. Ahn, National Chiao Tung Univ. (Taiwan)
M.-T. Lee, National Chiao Tung Univ. (Taiwan)
Y.-M. Chang, National Chiao Tung Univ. (Taiwan)
J. L. Peng, Industrial Technology Research Institute (Taiwan)
S. Gwo, National Tsing Hua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 8625:
Gallium Nitride Materials and Devices VIII
Jen-Inn Chyi; Yasushi Nanishi; Hadis Morkoç; Joachim Piprek; Euijoon Yoon; Hiroshi Fujioka, Editor(s)

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