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Proceedings Paper

Integration of photochemical processes of silicon surface cleaning with deposition of thin solid films
Author(s): A. P. Alekhin; Yu. S. Bokov; L. A. V'iukov; A. M. Markeev; V. N. Nevolin; N. S. Samsonov; V. Yu. Fominski
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Paper Abstract

The possibility of a low temperature technique development including combined photochemical processes of the silicon substrate cleaning, chemical vapor deposition and post treatment of SiO2 has been demonstrated.

Paper Details

Date Published: 12 December 1994
PDF: 11 pages
Proc. SPIE 2332, Second International Symposium on Advanced Laser Technologies, (12 December 1994); doi: 10.1117/12.195878
Show Author Affiliations
A. P. Alekhin, Zelenograd Institute of Physical Problems (Russia)
Yu. S. Bokov, Zelenograd Institute of Physical Problems (Russia)
L. A. V'iukov, Zelenograd Institute of Physical Problems (Russia)
A. M. Markeev, Zelenograd Institute of Physical Problems (Russia)
V. N. Nevolin, Moscow Engineering Physics Institute (Russia)
N. S. Samsonov, Zelenograd Institute of Physical Problems (Russia)
V. Yu. Fominski, Moscow Engineering Physics Institute (Russia)


Published in SPIE Proceedings Vol. 2332:
Second International Symposium on Advanced Laser Technologies
Vladimir I. Pustovoy; Miroslav Jelinek, Editor(s)

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