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Proceedings Paper

SCALPEL system
Author(s): Steven D. Berger; Christopher J. Biddick; Myrtle I. Blakey; Kevin J. Bolan; Stephen W. Bowler; Kevin J. Brady; Ron M. Camarda; Wayne F. Connelly; Reginald C. Farrow; Joseph A. Felker; Linus A. Fetter; Lloyd R. Harriott; Harold A. Huggins; Joseph S. Kraus; James Alexander Liddle; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody; Thomas M. Russell; Wayne M. Simpson; Regine G. Tarascon-Auriol; Harry H. Wade; Warren K. Waskiewicz; Pat G. Watson
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Paper Abstract

We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

Paper Details

Date Published: 7 December 1994
PDF: 8 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195843
Show Author Affiliations
Steven D. Berger, AT&T Bell Labs. (United States)
Christopher J. Biddick, AT&T Bell Labs. (United States)
Myrtle I. Blakey, AT&T Bell Labs. (United States)
Kevin J. Bolan, AT&T Bell Labs. (United States)
Stephen W. Bowler, AT&T Bell Labs. (United States)
Kevin J. Brady, AT&T Bell Labs. (United States)
Ron M. Camarda, AT&T Bell Labs. (United States)
Wayne F. Connelly, AT&T Bell Labs. (United States)
Reginald C. Farrow, AT&T Bell Labs. (United States)
Joseph A. Felker, AT&T Bell Labs. (United States)
Linus A. Fetter, AT&T Bell Labs. (United States)
Lloyd R. Harriott, AT&T Bell Labs. (United States)
Harold A. Huggins, AT&T Bell Labs. (United States)
Joseph S. Kraus, AT&T Bell Labs. (United States)
James Alexander Liddle, AT&T Bell Labs. (United States)
Masis M. Mkrtchyan, AT&T Bell Labs. (United States)
Anthony E. Novembre, AT&T Bell Labs. (United States)
Milton L. Peabody, AT&T Bell Labs. (United States)
Thomas M. Russell, AT&T Bell Labs. (United States)
Wayne M. Simpson, AT&T Bell Labs. (United States)
Regine G. Tarascon-Auriol, AT&T Bell Labs. (United States)
Harry H. Wade, AT&T Bell Labs. (United States)
Warren K. Waskiewicz, AT&T Bell Labs. (United States)
Pat G. Watson, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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