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Proceedings Paper

Overview of extreme ultraviolet lithography
Author(s): Frits Zernike
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Paper Abstract

Extreme UV lithography offers the possibility of printing CDs of 100 nm and smaller with a reduction tool. Because of the wavelength used, the optics have to be all-reflecting. The tool depends on multilayer coatings for the mirrors. A laser-produced plasma is being developed as a granular source. The mask also has to be reflecting. Top surface imaging resist will be used. The work here described is being performed in a National Program set up by the U.S. Department of Energy.

Paper Details

Date Published: 7 December 1994
PDF: 4 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195842
Show Author Affiliations
Frits Zernike, Sandia National Lab. (Netherlands)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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