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Proceedings Paper

Life after the 256-Mb DRAM: e-beam mask makers at the year 2000
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Paper Abstract

Lithography systems for sub-0.25micrometers designs will probably require masks with very high data content, small feature sizes, and extreme accuracies. Moreover, the mask substrates themselves will probably be exotic, compared with today's quartz blanks. We examine the requirements set forth in wafer lithography technology roadmaps and the published characteristics for proposed lithography tools to extrapolate to the mask pattern generation requirements. We then examine the implications for the maskmaking tools in the year 2000. These requirements lead to a discussion of the Etec Excalibur e-beam mask writer program. Finally, we comment on the prospects of an e-beam direct write technology applicable to the year 2000 production requirements and discuss the potential of some architectures proposed in the literature. We intend to show why radical innovation will be required above and beyond what has been disclosed to date.

Paper Details

Date Published: 7 December 1994
PDF: 9 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195840
Show Author Affiliations
Keith P. Standiford, Etec Systems, Inc. (United States)
John C. Wiesner, Nikon Precision, Inc. (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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