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Proceedings Paper

Two-level masks for increased depth of focus
Author(s): Rudolf M. von Buenau; Ricardo A. Diola; Paul DePesa; Stanney M. Kay; David A. Markle; Elizabeth Tai; Roger Fabian W. Pease
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Paper Abstract

We have explored two-level, or `twin' masks as a mask-based means of increasing depth of focus. Simulations have shown that the technique offers substantial gains for a variety of pattern types. To verify this experimentally, we have fabricated a test mask containing two- level as well as conventional mask patterns. We have performed through-focus series of photoresist exposures and demonstrated the expected improvement in focus latitude.

Paper Details

Date Published: 7 December 1994
PDF: 8 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195837
Show Author Affiliations
Rudolf M. von Buenau, Stanford Univ. (Germany)
Ricardo A. Diola, Diamon Images (United States)
Paul DePesa, Diamon Images (United States)
Stanney M. Kay, Ultratech Stepper (United States)
David A. Markle, Ultratech Stepper (United States)
Elizabeth Tai, Ultratech Stepper (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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