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Proceedings Paper

Attenuated phase-shifting mask blanks for the deep ultraviolet
Author(s): Yasuo Tokoro; Susumu Kawada; Tsuneo Yamamoto; Yoshihiro Saito; Atsushi Hayashi; Akihiko Isao
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Paper Abstract

ULCOAT has developed an attenuated phase shifting mask blank which has entered the production level for i-line blanks, with 180 degree(s) shifting angle and 5% to 20% transmittance. A single layer of MoSiON is employed as the phase shifter. Its simple structure enables good repeatability and stability in the mask making process. This single layer has 5% to 8% transmittance, with 180 degree(s) shifting angle at the deep ultra violet level (KrF Laser). However, it cannot be inspected at 488 nm (the wavelength of a popular pattern checker), due to more than 40% transmittance at that wavelength. Therefore, for deep ultra violet level work, a multi-layer type of MoSiON has been developed by ULCOAT, which achieves less than 40% transmittance at 488 nm.

Paper Details

Date Published: 7 December 1994
PDF: 5 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195836
Show Author Affiliations
Yasuo Tokoro, ULVAC Coating Corp. (United States)
Susumu Kawada, ULVAC Coating Corp. (Japan)
Tsuneo Yamamoto, ULVAC Coating Corp. (Japan)
Yoshihiro Saito, ULVAC Coating Corp. (Japan)
Atsushi Hayashi, ULVAC Coating Corp. (Japan)
Akihiko Isao, ULVAC Coating Corp. (Japan)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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