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Proceedings Paper

Application of charge-dissipation material in MEBES phase-shift mask fabrication
Author(s): Zoilo C. H. Tan; Charles A. Sauer
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Paper Abstract

Several charge dissipation materials were evaluated for their ability to improve the overlay accuracy during phase shift mask (PSM) registered writing on a MEBES system. These included an organic conductive polymer and a number of thin inorganic films, which were applied above or below the resist on a coated mask. When used with the resists, all conductive materials evaluated were capable of providing adequate charge dissipation during registered writing. Overlay accuracy of mean + 3 sigma <EQ 0.07 micrometers was obtained in both axes. The water-cast conductive polymer was found to be the easiest to use.

Paper Details

Date Published: 7 December 1994
PDF: 8 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195834
Show Author Affiliations
Zoilo C. H. Tan, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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