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Proceedings Paper

Chromium-based attenuated embedded shifter preproduction
Author(s): Franklin D. Kalk; Roger H. French; H. Ufuk Alpay; Greg P. Hughes
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Paper Abstract

Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.

Paper Details

Date Published: 7 December 1994
PDF: 6 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195825
Show Author Affiliations
Franklin D. Kalk, E.I. du Pont de Nemours & Co., Inc. (United States)
Roger H. French, E.I. du Pont de Nemours & Co., Inc. (United States)
H. Ufuk Alpay, E.I. du Pont de Nemours & Co., Inc. (United States)
Greg P. Hughes, E.I. du Pont de Nemours & Co., Inc. (United States)


Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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