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Proceedings Paper

CD data requirements for proximity effect corrections
Author(s): Richard C. Henderson; Oberdan W. Otto
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Paper Abstract

With i-line steppers and 0.5 micrometers lines the line size error due to the optical proximity effect is shown by simulation to be 35% - 60% of the CD error budget. Correcting for the error with individual feature biasing requires potentially thousands of line size measurements. Measuring only the isolated line or the equal line/gap pattern is insufficient. A minimal test pattern consists of 108 iterations of the dimensions and spacings of a three line pattern. Experimental measurements from this minimal set can be combined with simulation by anchoring and reshaping the more detailed simulation data.

Paper Details

Date Published: 7 December 1994
PDF: 11 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195817
Show Author Affiliations
Richard C. Henderson, Trans Vector Technologies, Inc. (United States)
Oberdan W. Otto, Trans Vector Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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