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Proceedings Paper

Design and fabrication of soft defect test reticles
Author(s): Steven J. Schuda; Donald Parker
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Paper Abstract

Soft reticle defects which print to the wafer are of concern to wafer fabs because of their potential impact on wafer yields. The final mask shop inspection is commonly performed on a laser scattering inspection system. The most common soft defect test reticles in use for evaluating sensitivity of these inspection tools do not represent thin flat transparent contaminates. To address this problem, the Orion test reticles have been designed and built with programmed thin flat transparent soft defects for evaluating sensitivity of inspection systems. The Orion test reticles were inspected with laser scattering and STARlight inspection systems. Results indicate fundamental problems with defect sensitivity and pattern false defects on laser scattering inspection tools. Defect printing experiments demonstrate that the thin flat transparent defect type selected for the Orion reticle design is critical to detect because it prints to the wafer.

Paper Details

Date Published: 7 December 1994
PDF: 9 pages
Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); doi: 10.1117/12.195813
Show Author Affiliations
Steven J. Schuda, KLA Instruments Corp. (United States)
Donald Parker, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 2322:
14th Annual BACUS Symposium on Photomask Technology and Management
William L. Brodsky; Gilbert V. Shelden, Editor(s)

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