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Proceedings Paper

Characteristic curves and phase-exposition characteristics of holographic photomaterials
Author(s): Alexandr L. Tchurajev; V. V. Artyomova
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Paper Abstract

The article is devoted to the inverstigation of the dependence between hologram phase shift quantity and its optical density in wide interval of exposures and kinds of developments. The characteristic curves arid phaseexposure characteristics have the similar appearance the initial parts of the curves are straight lines then it can be seen the slowdown of the growth of both curves. The slope of linear parts of the curves depends upon the development time nature of developer the type of photoemulsion and the hologram recording space frequences. The investigation of photomaterial optical characteristics which cause the different parametries of holograms is one of the actual questions conserned with evaluation of holographic image qualityt''2''3''4. The determinational methods of these characteristics were proposed in it was payed attention to the linear character of the dependence of bleached holograms phase shift A4 upon its optical density AD before bleaching3''61 K-AD(AE) () where AE the change of exposure which causes the change of optical density AD K - constant which depends only upon the type of used bleaching agent. The practical value of this equation is explained by its simplicity. However the interval of exposures in which this statement is correct was not distinct before the present time. Usually the quantity AD is calculated on the low 158 / SPIE Vol. 1238 Three-Dimensional Holography: Science Culture Education (1989)

Paper Details

Date Published: 1 February 1991
PDF: 8 pages
Proc. SPIE 1238, Three-Dimensional Holography: Science, Culture, Education, (1 February 1991); doi: 10.1117/12.19390
Show Author Affiliations
Alexandr L. Tchurajev, Vavilov State Optical Institute (Russia)
V. V. Artyomova, Vavilov State Optical Institute (Russia)

Published in SPIE Proceedings Vol. 1238:
Three-Dimensional Holography: Science, Culture, Education
Tung H. Jeong; Vladimir B. Markov, Editor(s)

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