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Proceedings Paper

Prospects for supermirrors in hard x-ray spectroscopy
Author(s): Karsten Dan Joensen; Paul Gorenstein; Finn Erland Christensen; Peter Hoghoj; Eric Ziegler; Jean Susini; Andreas K. Freund; D. Peter Siddons; James L. Wood
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Paper Abstract

Supermirrors are multilayer structures where the thickness of the layers down through the structure changes so that wide-band reflection occurs. The principles were developed in the mid-70s and have been used extensively for neutron optics. Absorption in the upper layers limits the attainable reflectivity for x rays. For hard x rays (>= 15 keV), the absorption, however, is low enough that it is possible to design supermirrors with 10 - 70% reflectivity in a band approximately equals 3 times the width of the total reflection regime. Supermirrors of W/Si and Ni/C have been successfully fabricated and characterized. The measured x-ray reflectivities are well accounted for by the standard dynamical theories of multilayer reflection. Hard x ray applications that could benefit from x-ray supermirror coatings include focusing and imaging instrumentation for astrophysics, collimating and focusing devices for synchrotron radiation, and particle filtering in plasma diagnostics.

Paper Details

Date Published: 7 November 1994
PDF: 12 pages
Proc. SPIE 2283, X-Ray and Ultraviolet Spectroscopy and Polarimetry, (7 November 1994); doi: 10.1117/12.193181
Show Author Affiliations
Karsten Dan Joensen, Harvard-Smithsonian Ctr. for Astrophysics (Denmark)
Paul Gorenstein, Harvard-Smithsonian Ctr. for Astrophysics (United States)
Finn Erland Christensen, Danish Space Research Institute (Denmark)
Peter Hoghoj, European Synchrotron Radiation Facility (France)
Eric Ziegler, European Synchrotron Radiation Facility (France)
Jean Susini, European Synchrotron Radiation Facility (France)
Andreas K. Freund, European Synchrotron Radiation Facility (France)
D. Peter Siddons, National Synchrotron Light Source (United States)
James L. Wood, Ovonic Synthetic Materials Co., Inc. (United States)


Published in SPIE Proceedings Vol. 2283:
X-Ray and Ultraviolet Spectroscopy and Polarimetry
Silvano Fineschi, Editor(s)

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