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Proceedings Paper

Plane multilayer amplitude gratings fabrication and measurement: recent results
Author(s): Douglas P. Hansen; Hans K. Pew; David D. Allred; John R. Colton; Gary L. Stradling; John E. Gunther; Serban Porumbescu
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Paper Abstract

MOXTEK and its collaborators have developed technology for the fabrication of multilayer soft x-ray diffraction gratings. The diffraction gratings we will discuss here are planar, or lamellar amplitude gratings, with a structure similar to that shown in Figure 1 . The gratings we have fabricated and measured consist of a silicon (100) wafer substrate onto which we spin photo-resist. The photo-resist is patterned holographically and the substrate is then etched using reactive plasma processing techniques. The period, or pitch of these gratings Is 0.293 jim, and the grating active area can be as large as 6 cm x 6 cm. The linespace relationship is approximately 50-50. The substrates are etched until the grooves are about 1 200 A deep. This Is done to place the bottom of the grooves deep Into the substrate where It will not be able to scatter x-ray radiation efficiently. A typical substrate is shown in Figure 2.

Paper Details

Date Published: 11 November 1994
PDF: 7 pages
Proc. SPIE 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics, (11 November 1994); doi: 10.1117/12.193174
Show Author Affiliations
Douglas P. Hansen, MOXTEK, Inc. (United States)
Hans K. Pew, MOXTEK, Inc. (United States)
David D. Allred, MOXTEK, Inc. (United States)
John R. Colton, MOXTEK, Inc. (United States)
Gary L. Stradling, Los Alamos National Lab. (United States)
John E. Gunther, Hughes Power Products (United States)
Serban Porumbescu, Solid State Systems (United States)

Published in SPIE Proceedings Vol. 2279:
Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics
Richard B. Hoover; Arthur B. C. Walker Jr., Editor(s)

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