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Proceedings Paper

Laser reactive ablation deposition of titanium nitride and titanium carbide films
Author(s): Emilia D'Anna; Gilberto Leggieri; Armando Luches; Maurizio Martino; Alessio Perrone; Guiseppe Majni; Paolo Mengucci; Ion N. Mihailescu
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Paper Abstract

Titanium nitride and titanium carbide films were deposited on silicon substrates by XeCl excimer laser reactive ablation of titanium in nitrogen and methane atmospheres, respectively. A series of 10,000 pulses at the fluence of approximately 5 J/cm2 and repetition rate of 10 Hz were directed to the target. The pressure in the chamber was fixed, during every irradiation series, at a given value within the range 6 X 10-4 - 10 mbar of N2 or CH4. Very flat films with thickness exceeding 1 micrometers were deposited. The structural characteristics of the deposited films were investigated by Rutherford backscattering spectrometry, scanning electron microscopy, and by x-ray diffraction. Under specific experimental conditions very pure nitride films were deposited.

Paper Details

Date Published: 4 November 1994
PDF: 11 pages
Proc. SPIE 2246, Laser Materials Processing and Machining, (4 November 1994); doi: 10.1117/12.193108
Show Author Affiliations
Emilia D'Anna, Univ. di Lecce (Italy)
Gilberto Leggieri, Univ. di Lecce (Italy)
Armando Luches, Univ. di Lecce (Italy)
Maurizio Martino, Univ. di Lecce (Italy)
Alessio Perrone, Univ. di Lecce (Italy)
Guiseppe Majni, Univ. di Ancona (Italy)
Paolo Mengucci, Univ. di Ancona (Italy)
Ion N. Mihailescu, Institute of Atomic Physics (Romania)

Published in SPIE Proceedings Vol. 2246:
Laser Materials Processing and Machining
Rolf-Juergen Ahlers; Peter Hoffmann; Hermann Lindl; Ruediger Rothe, Editor(s)

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