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Proceedings Paper

Fabrication and properties of multilayer porous silicon filters
Author(s): Michael G. Berger; S. Frohnhoff; Ruedger Arens-Fischer; M. Thoenissen; C. Dieker; H. Muender; Hans Luth; Wolfgang Theiss; M. Arntzen
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Paper Abstract

Porous silicon multilayer systems formed by different techniques were investigated. Type I layer systems are fabricated by changing the current density during the anodic etch process. Type II samples are formed with a constant current density but using a substrate with alternating doping levels. The superlattice structure is clearly visible in transmission electron microscope pictures. The quality of the interfaces depends on the formation technique. Porous silicon multilayer systems exhibit sharp peaks in the reflectance spectrum and can be used as filters. The line narrowing of the broad photoluminescence band of porous silicon by a Fabry- Perot filter structure is demonstrated.

Paper Details

Date Published: 4 November 1994
PDF: 7 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192162
Show Author Affiliations
Michael G. Berger, Forschungszentrum Juelich GmbH (Germany)
S. Frohnhoff, Forschungszentrum Juelich GmbH (Germany)
Ruedger Arens-Fischer, Forschungszentrum Juelich GmbH (Germany)
M. Thoenissen, Forschungszentrum Juelich GmbH (Germany)
C. Dieker, Forschungszentrum Juelich GmbH (Germany)
H. Muender, Forschungszentrum Juelich GmbH (Germany)
Hans Luth, Forschungszentrum Juelich GmbH (Germany)
Wolfgang Theiss, RWTH Aachen (Germany)
M. Arntzen, RWTH Aachen (Germany)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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