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Proceedings Paper

In situ optical multichannel spectrometer system
Author(s): Harry H. Bauer; Erwin Nuessler
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Paper Abstract

We have realized an in-situ multichannel spectrometer system for on line optical thin film controlling during deposition. The system is working as a thin film optical monitor as well as an universal process control system. The measurements are made on the original optics during rotation, to avoid tooling factor errors and to take advantage of error compensation of successive layers. The typical thickness accuracy is 0.25% of the design wavelength.

Paper Details

Date Published: 4 November 1994
PDF: 9 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192115
Show Author Affiliations
Harry H. Bauer, Carl Zeiss (Germany)
Erwin Nuessler, Carl Zeiss (Germany)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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