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Proceedings Paper

Properties of rf magnetron-sputtered C and C:N thin films
Author(s): Jaroslav Sobota; Jiri Hrdina; Vladimir Vorlicek; Ivan Gregora; Petr Siroky; Vratislav Perina
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Paper Abstract

A series of nitrogenated and nitrogen-free carbon films was prepared under various deposition conditions (substrate temperatures between 40 - 535 degree(s)C and working gas pressures between 0.09 - 5.0 Pa). Rutherford backscattering, Raman scattering, surface profilometry, ellipsometry, hardness and adhesion measurements were performed and results were related to both nitrogen and oxygen content in the layers.

Paper Details

Date Published: 4 November 1994
PDF: 12 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192091
Show Author Affiliations
Jaroslav Sobota, Institute of Scientific Instruments (Czech Republic)
Jiri Hrdina, Institute of Physics (Czech Republic)
Vladimir Vorlicek, Institute of Physics (Czech Republic)
Ivan Gregora, Institute of Physics (Czech Republic)
Petr Siroky, HVM Plasma Ltd. (Czech Republic)
Vratislav Perina, Institute of Nuclear Physics (Czech Republic)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings

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