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Proceedings Paper

In situ growth studies of nanometer thin-film multilayers using grazing x-ray reflectivity and ellipsometry
Author(s): Eike Lueken; Eric Ziegler; P. Hoeghoej; Andreas K. Freund; Erich Gerdau; Alain Fontaine
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Paper Abstract

This paper presents a new type of X-ray reflectometer that measures the grazing incidence reflectivity at an energy of 8 keV for angles from 0 - 2.5 degree(s) simultaneously. With an acquisition time of 5 s this allows to analyze the layer growth during a deposition process with a thickness accuracy in the sub-nm range. As a second independent method we are using kinetic and spectroscopic ellipsometry to follow the same deposition process.

Paper Details

Date Published: 4 November 1994
PDF: 6 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192085
Show Author Affiliations
Eike Lueken, European Synchrotron Radiation Facility (France)
Eric Ziegler, European Synchrotron Radiation Facility (France)
P. Hoeghoej, European Synchrotron Radiation Facility (France)
Andreas K. Freund, European Synchrotron Radiation Facility (France)
Erich Gerdau, Univ. Hamburg (Germany)
Alain Fontaine, LURE (France)

Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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