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Proceedings Paper

Fabrication, structure, optical properties, and stability of W-Si multilayer x-ray reflectors
Author(s): Hans-Joachim Kuehn; J. Kraeusslich
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Paper Abstract

Multilayer reflectors are necessary for spectroscopic and imaging systems, working with soft X-rays ((lambda) equals 1..20 nm), for instance for X-ray lithography, microscopy and holography. We have tested a simple method for deposition of multilayer X-ray reflectors by dc-plasmatron sputtering. W-Si multilayers with up to 80 layer pairs, prepared by this method, were characterized by X-ray reflection, AES, RBS, SNMS and AFM. Optical constants, individual layer thicknesses (1..3 nm) and interface roughness were determined by fit of the X-ray reflection curves.

Paper Details

Date Published: 4 November 1994
PDF: 8 pages
Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); doi: 10.1117/12.192084
Show Author Affiliations
Hans-Joachim Kuehn, Friedrich-Schiller-Univ. (Germany)
J. Kraeusslich, Friedrich-Schiller-Univ. (Germany)


Published in SPIE Proceedings Vol. 2253:
Optical Interference Coatings
Florin Abeles, Editor(s)

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